Chinese Physics B

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2011 Volume 20 Issue 9

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Huang An-Ping, Zheng Xiao-Hu, Xiao Zhi-Song, Yang Zhi-Chao, Wang Mei, Paul K.Chu, Yang Xiao-Dong. 2011: Flat-band voltage shift in metal-gate/high-k/Si stacks, Chinese Physics B, 20(9): 385-395. doi: 10.1088/1674-1056/20/9/097303

Citation:

Huang An-Ping, Zheng Xiao-Hu, Xiao Zhi-Song, Yang Zhi-Chao, Wang Mei, Paul K.Chu, Yang Xiao-Dong. 2011: Flat-band voltage shift in metal-gate/high-k/Si stacks, Chinese Physics B, 20(9): 385-395. doi: 10.1088/1674-1056/20/9/097303

Flat-band voltage shift in metal-gate/high-k/Si stacks

Department of Physics,Beihang University,Beijing 100191,China
Department of Physics and Materials Science,City University of Hong Kong,Tat Chee Avenue,Kowloon,Hong Kong,China
Department of Electrical and Computer Engineering,University of Florida,Gainesville,FL 32611,USA

Available Online: 30/09/2011
Fund Project: the National Natural Science Foundation of China(Grants .50802005 and 11074020)%the Program for New Century Excellent Talents in University,China(Grant NCET-08-0029)%the Ph.D.Program Foundation of Ministry of Education of China(Grant 200800061055)%the Hong Kong Research Grants Council General Research Funds,China(Grant CityU112608)